CETC Silicon Carbide (SiC) Process Equipment

Ion beam sputtering deposition equipment

Theequipmentismainlyusedinthemanufactureofmicroelectronicdevicesandthepreparationoffilmsofvariousmaterialsinthescientificresearchoffilmmaterials,includingthepr..
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Cluster magnetron sputtering system

Magnetronsputteringequipmentisamulti-functional,highefficiencycoatingequipment.Thinfilmsofmetal,nonmetal,oxide,mediumandothermaterialscanbesputteredonsubstrate..
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Scanning magnetron sputtering system

Magnetronsputteringequipmentisamulti-functional,highefficiencycoatingequipment.Thinfilmsofmetal,nonmetal,oxide,mediumandothermaterialscanbesputteredonsubstrate..
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Magnetron sputtering coater

Magnetronsputteringequipmentisamulti-functional,highefficiencycoatingequipment.Thinfilmsofmetal,nonmetal,oxide,mediumandothermaterialscanbesputteredonsubstrate..
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Liquid phase epitaxy equipment

ItissuitableforthegrowthofⅢ-Ⅴ(orⅡ-Ⅵ)compoundmaterials,suchastheliquidphaseepitaxygrowthofcompoundsemiconductorfilmsintheprocessofoptoelectronicdevicemanufactur..
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LPCVD

Chemicalvapordeposition(CVD)isoneofthemostimportantprocessesinsemiconductorICmanufacturing,whichismainlyusedforthegrowthofpolysilicon,siliconnitrideandsilicono..
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Flat PECVD

PlatePECVDismainlyusedforthedepositionandgrowthofSiO2andSiNxthinfilms.Itsworkingprincipleistointroducehighfrequencyandlowvoltage,andtodischargetheprocessgasglo..
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SiC epitaxial equipment

HomoepitaxialgrowthofthethirdgenerationwideandtightbandsemiconductorSiCmaterials.
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MOCVD

TheorganiccompoundsofgroupⅢ(groupⅡ)elementsandthehydridesofgroupⅤ(groupⅥ)elementsareusedasthecrystalgrowthsourcematerials.Thethinlayersinglecrystalmaterialsofv..
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Vacuum annealing furnace

Vacuumannealingfurnaceisaheattreatmentequipmentcombiningvacuumtechnologyandelectricfurnaceheatingtechnology.Becausetheequipmentcanprovideacleanandimpurityfreeh..
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